P1

29

Nanoimprinted Complementary Organic Inverters

Ursula Palfinger, JOANNEUM RESEARCH  - Thomas Rothländer, JOANNEUM RESEARCH  - Herbert Gold, JOANNEUM RESEARCH  - Barbara Stadlober, JOANNEUM RESEARCH

P2

31

SU-8 Filled Waveguide With Holographic Grating For DFB Laser Buried In Nanoimprinted Grooves

Takao Tokuhara, Osaka City University  - Shusuke Asahi, Osaka City University  - Yuta Aoki, Osaka City University  - Hiroshi Kumagai, Osaka City University  - Tahito Aida, Osaka City University

P3

35

Metal Liftoff Using Solvent Soluble UV-NIL Resist

Tomoki Nishino, Osaka Pref. Univ.  - Hiroto Miyake, Daisel Chemical  - Kohei Tomohiro, Osaka Pref. Univ.  - Takao Yukawa, Daisel Chemical  - Junji Sakamoto, Osaka Pref. Univ.  - Hiroaki Kawata, Osaka Pref. Univ.  - Yoshihiko Hirai, Osaka Pref. Univ.

P4

56

Fabrication Of Reflective Microlens By Imprinting Technology- A Molecular Dynamics Simulation Study

Ming-Chieh Cheng, National Tsing Hua University  - Cheng-Kuo Sung, National Tsing Hua University

P5

60

Topography Extraction Of 3d Structures Through Afm Of Nanoimprints

Simon Waid, Vienna University of Technology  - Heinz D Wanzenboeck, Vienna University of Technology  - Gerhard Hobler, Vienna University of Technology  - Thomas Zahel, Vienna University of Technology  - Emmerich Bertagnolli, Vienna University of Technology  - Michael Muehlberger, Profactor GmbH  - Rainer Schoeftner, Profactor GmbH

P6

61

Nanoimprinted Semi-Transparent Continuous Electrodes Towards Enhanced Performances Of Light Emitting Devices

Vincent Reboud, Catalan Institute of Nanotechnology  - Ali Z Khokhar, Department of Electronics & Electrical Engineering  - Gaetan Leveque, Tyndall National Institute  - Borja Sepúlveda, Research Centre on Nanoscience and Nanotechnology  - Damian Dudek, Catalan Institute of Nanotechnology  - Tim Kehoe, Catalan Institute of Nanotechnology  - Nikolaos Kehagias, Catalan Institute of Nanotechnology  - Nikolaj Gadegaard, Department of Electronics & Electrical Engineering  - Vito Lambertini, Centro Ricerche FIAT  - Valentina Grasso, Centro Ricerche FIAT  - Clivia M Sotomayor Torres, Catalan Institute of Nanotechnology

P7

80

Nanoimprinting For Chemical Synthesis

Hong Yee Low, Institute of materials Research and Engineering

P8

97

Fabrication Of Large-Area Gratings With Tunable Periods By Double Nanoimprinting Of 1-D Gratings

Wen-Di Li and Stephen Y. Chou, Princeton

P9

98

Nanoimprint Lithography For Solar Cell Texturisation

 Hubert Hauser*, B. Michl*, S. Schwarzkopf*, V. Kübler*, C. Müller**, M. Hermle* and B. Bläsi*
* Fraunhofer Institute for Solar Energy Systems ISE, ** Laboratory for Process Technology, Department of Microsystems Engineering – IMTEK, University of Freiburg,

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P10

68

Residual Layer Free Polymer Waveguides And Microring Resonators Realized With Uvassisted Nanoimprint

Robert Kirchner, Fraunhofer-Institute IPMS  - René Kullock - Lukas Eng - Wolf-Joachim Fischer

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P11

3

Nanostructuration By Nanoimprint Lithography Of Hybrid Silica Coatings

Alban A Letailleur, Saint-Gobain Recherche  - Cedric Boissière, CNRS/UPMC  - François Ribot, CNRS/UPMC  - Clément Sanchez, CNRS/UPMC  - Jérémie Teisseire, CNRS/Saint-Gobain  - Etienne Barthel, CNRS/Saint-Gobain  - Elin Sondergard, CNRS/Saint-Gobain  - Stefan Mc Murtry, Université de Technologie de Troyes  - Christophe Couteau, Université de Technologie de Troyes  - Gilles Lérondel, Université de Technologie de Troyes  - Nicolas Chemin, Saint-Gobain Recherche

P12

12

Effects Of The Surface Properties Of Self-Assembled Monolayer (SAM) Treated Nanoimprint Molds For Molding And Demolding Processes

Kazuhisa Kumazawa, Nippon Soda Co., LTD.  - Yoshitaka Fujita, Nippon Soda Co., LTD.  - Norifumi Nakamoto, Nippon Soda Co., LTD.  - Haruo Saso, Nippon Soda Co., LTD.

P13

28

Direct Imprinting, Post Processing, And Characterization Of Functional UV-Curing Materials

Holger Schmitt, Fraunhofer IISB  - Fabian Kett, Fraunhofer IISB  - Mathias Rommel, Fraunhofer IISB  - Anton J Bauer, Fraunhofer IISB  - Michael Hornung, SUSS MicroTec Lithography GmbH  - Lothar Frey, Fraunhofer IISB, Chair of Electron Devices

P14

49

Light Extraction Study On Quantum Dots Embedded In Nanoimprinted Silica Matrix

Alban A Letailleur, Saint-Gobain Recherche  - Thomas Richardot, CNRS/Saint-Gobain  - François Ribot, UPMC/Collège de France  - Cédric Boissière, UPMC/Collège de France  - Clément Sanchez, UPMC/Saint-Gobain  - Etienne Barthel, CNRS/Saint-Gobain  - Elin Søndergård, CNRS/Saint-Gobain  - Christophe Couteau, Université de Technologies Troyes  - Gilles Lérondel, Université de Technologies Troyes  - Nicolas Chemin, Saint-Gobain Recherche

P15

55

Reduction Of The Release Forces Of Polymers For Thermal Nil And Their Quantification

Hakan H Atasoy, micro resist technology GmbH  - Marko Vogler, micro resist technology GmbH  - Tomi Haatainen, VTT Micro and Nanoelectronics  - Arne Schleunitz, Paul Scherrer Institute  - Helmut Schift, Paul Scherrer Institute  - Freimut Reuther, micro resist technology GmbH  - Gabi Gruetzner, micro resist technology GmbH

P16

73

Resists For Efficient Nanoimprint Processes - Challenges For The Materials Scientist

Marko Vogler, micro resist technology  - Freimut Reuther, micro resist technology  - Anna Klukowska-Kahlenberg, micro resist technology  - Gabi Grützner, micro resist technology

P17

86

A Method For Estimation Of Rheological Behaviour Of Ultrathin Resist Films

Dariusz Jarzabek, Warsaw University of Technology  - Zygmunt Rymuza, Warsaw University of Technology

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P18

90

NFFA - Nanoscience Foundries and Fine Analysis

Jens Gobrecht - Christian David - Giorgio Rossi - Regina Ciancio - Cristina Africh - Roberto Gotter - Giancarlo Panaccione - Roberta Ferranti - Daniela Orani - Emilio Lora Tamayo - Luis Fonseca - Justin Greenhalgh - Graham Arthur - Ejaz Huq - Peter Laggner - Heinz Amenitsch - Karin Jungnikl - Barbara Sartori

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P19

2

Reactive-Monolayer-Assisted Thermal Nanoimprint Lithography For Fine Metal Patterning

Shoichi Kubo, Tohoku University  - Koichi Nagase, Tohoku University  - Masaru Nakagawa, Tohoku University

P20

4

Fluorescent Radical Polymerization Resin And Its Advantages In UV Nanoimprinting

Kei Kobayashi, Tohoku University  - Shoichi Kubo, Tohoku University  - Hiroshi Hiroshima, National Institute of Advanced Industrial Science  - Takeshi Ohsaki, Toyo Gosei Co., Ltd.  - Shinji Matsui, University of Hyogo  - Masaru Nakagawa, Tohoku University

P21

7

Improvement Of Replica Mold Releasability By Ganti-Sticking Cure Process (ACP)H

YASUHIDE KAWAGUCHI, ASAHI GLASS Co.,LTD.  - Kentaro Tsunozaki, ASAHI GLASS Co.,LTD.  - Lingyi Li, Waseda University  - Shuichi Shoji, Waseda University  - Jun Mizuno, Waseda University

P22

10

Characteristics Evaluation Of Side Chain Crystalline Polymer For Nanoimprinting

M Okada, University of Hyogo  - S Nakano, NITTA Co.  - K Yamashita, NITTA Co.  - S Kawahara, NITTA Co.  - S Matsui, University of Hyogo

P23

14

Gas-Assisted Micro-Area Step-And-Flash Imprinting Lithography

Su Shen, SVG Optronics Corp.  - Guo Jun Wei, Soochow University  - Dong Lin Pu, Soochow University  - Lin Sen Chen, Soochow University

P24

15

Nanoimprinting Solutions For High Density Memory Storage

Gang Luo, Obducat AB.  - Ye Zhou, Obducat AB.  - Roland Palm, Obducat AB.  - Torbjörn Eriksson, Obducat AB.  - Babak Heidari, Obducat AB.

P25

19

Evaluation Of Interaction Between Antisticking Layer And UV Curable Resin By Scanning Probe Microscopy

Makoto Okada, Graduate School of Science, Univ. of Hyo  - Masayuki Iwasa, SII NanoTechnology Inc.  - Yuichi Haruyama - Kazuhiro Kanda - Kei Kuramoto - Masaru Nakagawa - Shinji Matsui

P26

20

Fabrication And Characterization Of Siox Moth-Eye Structure By Room-Temperature Nanoimprint Using Caged- And Ladder-HSQ

Yuji Kang, University of Hyogo  - Makoto Okada, University of Hyogo  - Kazuhiro Kanda, University of Hyogo  - Yuichi Haruyama, University of Hyogo  - Shinji Matsui, University of Hyogo

P27

22

Role Of Confinement On Material Flow In Nano-Structured Geometry

Jérémie Teisseire, Surface du Verre et Interface - CNRS/Sai  - Amélie Revaux, Surface du Verre et Interface - CNRS/Sai  - Maud Sarrant-Foresti, Saint-Gobain Recherche  - Elin Sondergard, Surface du Verre et Interface - CNRS/Sai  - Etienne Barthel, Surface du Verre et Interface - CNRS/Sai

P28

24

Effects Of Substrate Deformation And Its Simple Estimation By Height Analysis Of Resist Top Surface

Hiroaki Kawata, Osaka Prefecture University  - Norihiro Fujikawa, Osaka Prefecture University  - Yuuta Watanabe, Osaka Prefecture University  - Masaaki Yasuda, Osaka Prefecture University  - Yoshihiko Hirai, Osaka Prefecture University

P29

25

Bubble Trapping In UV Nanoimprint Lithography Using A Capacity-Equalized Mold

Qing Wang, AIST  - Hiroshi Hiroshima, AIST  - Sung-Won Youn, AIST

P30

26

Self-Aligned Fabrication Of Flexible Organic Thin Film Transistors For Display Backplanes By Means Of Nanoimprint Lithography

Herbert Gold, Joanneum Research  - Ursula Palfinger, Joanneum Research  - Thomas Rothländer, Joanneum Research  - Andreas Petritz, Joanneum Research  - Frank Reil, Joanneum Research  - Barbara Stadlober, Joanneum Research

P31

32

Embossing Effect by Ulstrasonic Vibration Nanoimprint System

Atsumasa Sawada, AIST  - Kazunori Ootsuka - Harutaka Mekaru - Masaharu Takahashi

P32

34

Angle Controlled Imprints Using Step And Stamp Imprint Lithography

Tomi Haatainen, VTT  - Tapio Mäkelä, VTT  - Jouni Ahopelto, VTT  - Gilbert Lecarpentier, VTT

P33

36

Positive Resists For A T-NIL / UVL Hybrid Lithography

Saskia Möllenbeck, University of Wuppertal  - Khalid Dhima, University of Wuppertal  - Andre Mayer, University of Wuppertal  - Hella-Christin Scheer, University of Wuppertal

P34

37

Etch-Free Lift-Off With Sputtered Layers In T-NIL

Andre Mayer, University of Wuppertal  - Saskia Möllenbeck, University of Wuppertal  - Khalid Dhima, University of Wuppertal  - Hella-Christin Scheer, University of Wuppertal

P35

43

Si(111) Pits Fabricated By UV Nanoimprint Lithography With Replica Molds For The Site-Controlled Deposition Of Nanocrystals

Elisabeth Lausecker, University of Linz  - Martyna Grydlik, University of Linz  - Moritz Brehm, University of Linz  - Cornelia Reitböck, University of Linz  - Iris Bergmair, Profactor GmbH  - Michael Mühlberger, Profactor GmbH  - Maksym Yarema, University of Linz  - Wolfgang Heiss, University of Linz  - Thomas Fromherz, University of Linz  - Günther Bauer, University of Linz

P36

50

Characterisation Of Photoresists With Respect To Thermal Nanoimprint

Khalid Dhima, University of Wuppertal  - Saskia Möllenbeck, University of Wuppertal  - Andre Mayer, University of Wuppertal  - Hella-Christin Scheer, University of Wuppertal

P37

51

PSSQ Templates Fabricated By RUVNIL Technique For Di-Block Copolymer Graphoepitaxy

Nikos Kehagias, ICN  - Richard A Farrell - Marc Zelsmann - Achille Francone - Mustapha Chouiki - Rainer Schoeftner - Vincent Reboud - Justin Holmes - Michael Morris - Clivia Sotomayor Torres

P38

54

Multi-Tier Mold Fabrication By Gray Scale Laser Lithography Combined With Dry Etching

Sung-Won Youn, National Institute of AIST

P39

57

Pattern Transfer Of Organic Solar Material Using Novel Template

Norito Hoto, Osaka Pref. Univ.  - Tomoki Nishino, Osaka Pref. Univ.  - Jyunji Sakamoto, Osaka Pref. Univ.  - Hiroaki Kawata, Osaka Pref. Univ.  - Yoshihiko Hirai, Osaka Pref. Univ.

P41

76

Structuring Graphene Layers Using NIL

Iris Bergmair, Functional Surfaces&Nanostructures, PROFACTOR  - Maria Losurdo - Giovanni Bruno - Goran Isic - Milka Miric - Rados Gajic - Kurt Hingerl - Michael Muehlberger - Rainer Schoeftner

P42

75

Study And Development Of Polymer Destabilization By Capillary NIL

Céline Masclaux, LTM - CNRS  - Cécile Gourgon, LTM - CNRS

P43

77

Polymer Phoxonic Crystals Fabricated By Nanoimprint Lithography

Damian Dudek, Catalan Institute of Nanotechnology  - Vincent Reboud, Catalan Institute of Nanotechnology  - John Cuffe, Catalan Institute of Nanotechnology  - Nikolaos Kehagias, Catalan Institute of Nanotechnology  - Clivia Sotomayor Torres, Catalan Institute for Research and Advanced Studie

P44

82

Fabrication Of Sub-100 Nm Metal Nanowire Structure By Zero Residual Nanoimprint Lithography

Fantao Meng, Lund University

P45

83

In Situ Characterization Of Mold-Resist Adhesion In UV Nanoimprint Lithography

Thomas GLINSNER, EVGroup  - marc Zelsmann, LTM CNRS CEA Leti  - Achille Francone, LTM CNRS CEA Leti  - Gerald Kriendl, EVGroup  - Cristina Iojoiu, LEPMI  - Jumana BOUSSEY, LTM CNRS CEA Leti

P46

84

Fabrication Of Silicone Based Opto-Electronic Ring Resonator With Soft UV-NIL Process

Jung Wuk Kim, AMO GmbH  - Namil Koo, AMO GmbH  - Ulrich Plachetka, AMO GmbH  - Jens Bolten, AMO GmbH  - Michael Waldow, Institute of semiconductor Electronics RWTH Aachen  - Christian Moormann, AMO GmbH  - Heinrich Kurz, AMO GmbH

P47

85

Development Of Mold Fabrication Processes Using Ormostamp® Material For Step And Repeat UV-NIL

corinne perret, LTM  - Pietroy david, LTM  - labau sebastien, LTM  - gourgon cecile, LTM  - boussey jumana, LTM

P48

95

Sub-7 Nm Gap Bowtie Array By Post Fabrication Size Reduction Using Pressed Self - Perfection By Liquefaction (P-SPEL) And Nanoimprint

JIHOON KIM, Princeton University  - Fei Ding, Princeton University  - Stephen Y Chou, Princeton University

P49

92

Seamless Roller Mold Fabricated By Cylindrical Photolithography And Roller Imprinting Of Brightness Enhancement Film With Continuous Ball-Lens-Array

Yung-Chun Lee, National Cheng Kung University  - Hong-Wei Chen, National Cheng Kung University

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P50

5

Advanced Trench Filling Process Combing Thermal Imprint and Selective Copper Electrodeposition for Printed Wiring Board Fabrication

Hiroshi Yoshida, Materials Research Lab, Hitachi Ltd.  - Hiroshi Nakano, Materials Research Lab, Hitachi Ltd.  - Hitoshi Suzuki, Materials Research Lab, Hitachi Ltd.  - Toshio Haba, Materials Research Lab, Hitachi Ltd.  - Akira Chinda, Hitachi Cable Ltd.  - Haruo Akahoshi, Materials Research Lab, Hitachi Ltd.

P51

6

Resin Elongation Phenomenon in Nanoimprint Lithography

Kosuke Kuwabara, Hitachi Ltd.  - Akihiro Miyauchi, Hitachi Ltd.  - Hiroyuki Sugimura, Kyoto Univ.

P52

39

Controlled Formation of Dense Nanoshpere Arrays by Thermal Annealing of Nanoimprinted Lines for Nanodot Array Working Stamp Fabrication

Arne Schleunitz, Paul Scherrer Institut  - Christian Spreu, Paul Scherrer Institut  - JaeJong Lee, Korean Institute of Machinery and Materials  - Helmut Schift, Paul Scherrer Institut

P53

40

Evaluation of curing characteristics in UV-NIL resist

Akira Horiba, Osaka Pref. Univ.  - Ryosuke Suzuki, Osaka Pref. Univ.  - Yoshihiko Hirai, Osaka Pref. Univ.

P54

72

Fabrication of Wire Grid Polarizer for Visible Spectrum by Lift-off Process

Chien-Li Wu, National Tsing Hua University

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P55

42

UV enhanced substrate conformal imprint lithography (UV-SCIL) on SUSS mask aligners and its applications

Ran Ji, SUSS MicroTek Lithography GmbH  - Vu-Hoa Nguyen, SUSS MicroTek Lithography GmbH  - Michael Hornung, SUSS MicroTek Lithography GmbH

P56

94

Fabrication of Micro and Nano Patterns for Biosensor Applications using an automated Microcontact Printing Tool

Juan Pablo Agusil Antonoff, Institute for Bioengineering of Catalonia  - Marilia Barreiros dos Santos, Institute for Bioengineering of Catalonia  - Christian Sporer, Institute for Bioengineering of Catalonia  - Josep Samitier, Institute for Bioengineering of Catalonia

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P57

9

Nickel molds with 3 dimensional micro/nano features for biochips application

kambiz Ansari, Institute of Materials Research and Engi

P58

16

Metallic stamp replication based on reversal nanoimprint lithography

Gang Luo, Obducat AB.  - Ye Zhou, Obducat AB.  - Torbjörn Eriksson, Obducat AB.  - Babak Heidari, Obducat AB.

P59

18

Fabrication of Large Area Nanotemplate through Parallel Side-Bonding Process

Soon-Won Lee, Korea Institute of Machinery & Materials  - Sung-Je Park, Korea Institute of Machinery & Materials  - Ji-Hye Lee, Korea Institute of Machinery & Materials  - Jun-Ho Jeong, Korea Institute of Machinery & Materials  - Jun-Hyuk Choi, Korea Institute of Machinery & Materials

P60

23

Nickel stamp replication assisted by soft imprinting

Ye Zhou, Obducat technology AB  - Gang Luo, Obducat technology AB  - Ki D Lee, Obducat technology AB  - Roland Palm, Obducat technology AB  - Johan Ring, Obducat AB Sweden  - Torbjörn Eriksson, Obducat technology AB  - Rizgar Jiawook, Obducat technology AB  - Babak Heidari, Obducat technology AB

P61

44

Production Quality Of Working Stamps For Nanoimprint Lithography

Brian Bilenberg, NIL Technology ApS  - Poul Erik Hansen, Danish Fundamental Metrology  - Søren Dahl Petersen, NIL Technology ApS  - Gerald Kreindl, EV Group E. Thallner GmbH

P62

52

Fabrication Of Embedded Metal Stamps By Transferred Uv Nanoimprint Lithography

Nikos Kehagias, ICN  - Vincent Reboud, ICN  - Tim Kehoe, ICN  - Clivia Sotomayor Torres, ICN

P63

47

Modeling The Enhancement Of Nanoimprint Stamp Bending Compliance By Backside Grooves: Mitigating The Impact Of Wafer Nanotopography On Residual Layer Thickness

Hayden K Taylor, MIT  - Kristian Smistrup, NIL Technology  - Duane S Boning, MIT

P64

58

Curved And Sloped Nil Stamps - Fib As Versatile Approach Towards Complex 3d-Nil Stamps

Simon Waid, Vienna University of Technology  - Sasa Kutzkuresovic, Vienna University of Technology  - Heinz D Wanzenboeck, Vienna University of Technology  - Emmerich Bertagnolli, Vienna University of Technology  - Michael Muehlberger, Profactor GmbH  - Rainer Schoeftner, Profactor GmbH

P65

59

Impact Of The Stamp Sidewall-Inclination On The Replication Of Structures

Simon Waid, Vienna University of Technology  - Heinz D Wanzenboeck, Vienna University of Technology  - Emmerich Bertagnolli, Vienna University of Technology  - Michael Muehlberger, Profactor GmbH  - Rainer Schoeftner, Profactor GmbH

P66

62

12.5 Nm Half Pitch Nanoimprint Lithography Using Stamps Replicated From Charpan Master Templates

Dominik Treiblmayr - Michael Kast - Gerald Kreindl - Thomas Glinsner - Elmar Platzgummer - Hans Loeschner - Peter Joechl - Stefan Eder-Kapl - Thomas Narzt - Michael Muehlberger, Profactor GmbH  - Martin Boehm - Iris Bergmair - Mustapha Chouiki - Rainer Schoeftner - Elisabeth Lausecker - Thomas Fromherz

P67

65

Flexible Stamp With In-Situ Temperature Control

Kristian Smistrup, NIL Technology ApS  - Tobias Hedegaard, NIL Technology ApS  - Brian Bilenberg, NIL Technology ApS  - Jesper Nørregaard, NIL Technology ApS  - Saeed Abadei, Technical University of Denmark  - Ole Hansen, Technical University of Denmark  - Anders Kristensen, Technical University of Denmark  - Theodor K Nielsen, NIL Technology ApS

P68

93

Thermal Nil Of Large Area 12 Nm Euv Interference Lithography Gratings Into Resist With Improved Release Properties And Pattern Transfer

Christian Dais, Eulitha AG  - Harun H Solak, Eulitha AG  - Mirco Altana, U. Applied Sciences Northwestern Switzerland  - Christian Spreu, Paul Scherrer Institut  - Hakan Atasoy, micro resist technology GmbH  - Jens Gobrecht, U. Applied Sciences Northwestern Switzerland  - Helmut Schift, Paul Scherrer Institut

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P69

64

Polymer Stamp Imprinting In A Desktop Nil Tool Using Flexible Stamps

Kristian Smistrup, NIL Technology ApS  - Andrej Mironov, Technical University of Denmark  - Brian Bilenberg, NIL Technology ApS  - Theodor K Nielsen, NIL Technology ApS  - Anders Kristensen, Technical University of Denmark